Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization

Tucker, M, Ganesan, R, McCulloch, D, Partridge, J, Stueber, M, Ulrich, S, Bilek, M, McKenzie, D and Marks, N 2016, 'Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization', Journal of Applied Physics, vol. 119, no. 15, 155303, pp. 1-6.


Document type: Journal Article
Collection: Journal Articles

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Title Mixed-mode high-power impulse magnetron sputter deposition of tetrahedral amorphous carbon with pulse-length control of ionization
Author(s) Tucker, M
Ganesan, R
McCulloch, D
Partridge, J
Stueber, M
Ulrich, S
Bilek, M
McKenzie, D
Marks, N
Year 2016
Journal name Journal of Applied Physics
Volume number 119
Issue number 15
Article Number 155303
Start page 1
End page 6
Total pages 6
Publisher A I P Publishing LLC
Abstract High-power impulse magnetron sputtering (HiPIMS) is used to deposit amorphous carbon thin films with sp3 fractions of 13% to 82%. Increasing the pulse length results in a transition from conventional HiPIMS deposition to a "mixed-mode" in which an arc triggers on the target surface, resulting in a large flux of carbon ions. The films are characterized using X-ray photoelectron spectroscopy, Raman spectroscopy, ellipsometry, nanoindentation, elastic recoil detection analysis, and measurements of stress and contact angle. All properties vary in a consistent manner, showing a high tetrahedral character only for long pulses, demonstrating that mixed-mode deposition is the source of the high carbon ion flux. Varying the substrate bias reveals an "energy window" effect, where the sp3 fraction of the films is greatest for a substrate bias around -100 V and decreases for higher or lower bias values. In the absence of bias, the films' properties show little dependence on the pulse length, showing that energetic ions are the origin of the highly tetrahedral character.
Subject Synthesis of Materials
DOI - identifier 10.1063/1.4946841
Copyright notice © 2016 Author(s).
ISSN 0021-8979
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Citation counts: TR Web of Science Citation Count  Cited 9 times in Thomson Reuters Web of Science Article | Citations
Scopus Citation Count Cited 6 times in Scopus Article | Citations
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