Modified linear transmission line model test structure for determining specific contact resistance

Reeves, G, Pan, Y, Leech, P and Holland, A 2016, 'Modified linear transmission line model test structure for determining specific contact resistance', MRS Advances, vol. 1, no. 2, pp. 157-162.


Document type: Journal Article
Collection: Journal Articles

Title Modified linear transmission line model test structure for determining specific contact resistance
Author(s) Reeves, G
Pan, Y
Leech, P
Holland, A
Year 2016
Journal name MRS Advances
Volume number 1
Issue number 2
Start page 157
End page 162
Total pages 6
Publisher Cambridge University Press
Abstract A modified design of the transmission line model test structure uses the simple calculation of specific contact resistance, ρc, based on a two contact linear pattern but without the requirement of a mesa etch. This modified structure uses a linear TLM with semicircular terminations at each end. The function of the semicircular terminations is to confine the fringing fields at the ends of the linear TLM contacts. Simple analytical equations for determining ρc have been developed on the basis of the modified linear TLM pattern. These calculations have shown good agreement with a finite element model (FEM) of the modified TLM test structure using typical parameters for metal/ SiC contacts.
Subject Microelectronics and Integrated Circuits
DOI - identifier 10.1557/adv.2016.77
Copyright notice © 2016 Materials Research Society
ISSN 2059-8521
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