Photo-oxidation-modulated refractive index in Bi2Te3 thin films

Yue, Z, Chen, Q, Sahu, A, Wang, X and Gu, M 2017, 'Photo-oxidation-modulated refractive index in Bi2Te3 thin films', Materials Research Express, vol. 4, no. 12, pp. 1-1.

Document type: Journal Article
Collection: Journal Articles

Title Photo-oxidation-modulated refractive index in Bi2Te3 thin films
Author(s) Yue, Z
Chen, Q
Sahu, A
Wang, X
Gu, M
Year 2017
Journal name Materials Research Express
Volume number 4
Issue number 12
Start page 1
End page 1
Total pages 1
Publisher Institute of Physics Publishing
Abstract We report on an 800 nm femtosecond laser beam induced giant refractive index modulation and enhancement of near-infrared transparency in topological insulator material Bi2Te3 thin films. An ultrahigh refractive index of up to 5.9 was observed in the Bi2Te3 thin film in near-infrared frequency. The refractive index dramatically decreases by a factor of similar to 3 by an exposure to the 800 nm femtosecond laser beam. Simultaneously, the transmittance of the Bi2Te3 thin films markedly increases to similar to 96% in the near-infrared frequency. The Raman spectra provides strong evidences that the observed both refractive index modulation and transparency enhancement result from laser beam induced photooxidation effects in the Bi2Te3 thin films. The Bi2Te3 compound transfers into Bi2O3 and TeO2 under the laser beam illumination. These experimental results pave the way towards the design of various optical devices, such as near-infrared flat lenses, waveguide and holograms, based on topological insulator materials.
Subject Materials Engineering not elsewhere classified
Keyword(s) laser
refractive index
topological insulator
DOI - identifier 10.1088/2053-1591/aa9c94
Copyright notice © 2017 IOP Publishing Ltd
ISSN 2053-1591
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