Grafting of N-moieties onto octa-methyl polyhedral oligomeric silsesquioxane microstructures by sequential continuous wave and pulsed plasma

Chen, X, Chen, Z, Dumee, L, O'Dell, L, Du Plessis, J, d'Agostino, R, Dai, X and Magniez, K 2017, 'Grafting of N-moieties onto octa-methyl polyhedral oligomeric silsesquioxane microstructures by sequential continuous wave and pulsed plasma', Plasma Processes and Polymers, vol. 14, no. 10, pp. 1-10.


Document type: Journal Article
Collection: Journal Articles

Title Grafting of N-moieties onto octa-methyl polyhedral oligomeric silsesquioxane microstructures by sequential continuous wave and pulsed plasma
Author(s) Chen, X
Chen, Z
Dumee, L
O'Dell, L
Du Plessis, J
d'Agostino, R
Dai, X
Magniez, K
Year 2017
Journal name Plasma Processes and Polymers
Volume number 14
Issue number 10
Start page 1
End page 10
Total pages 10
Publisher Wiley-VCH Verlag
Abstract A functionalization of microstructures of polyhedral oligomeric silsesquioxane (POSS) to obtain substrates contain N-moieties, with a probable high selectivity of primary mines is demonstrated for the first time in a low pressure plasma process through a sequential continuous wave plus pulsed mode (CW + P). Selective grafting of N-moieties was performed across octa-methyl POSS micro-powder by substituting hydrogen atoms of the terminal methyl groups during nitrogen/hydrogen (N 2 /H 2 ) gases plasma. As opposed to wet chemical functionalization approaches, the plasma method does not require reactive chemicals and is environmentally friendly. The results demonstrate the efficiency of the treatment (N/Si) reaches 7.1% with an indication of high NH 2 selectivity (NH 2 /N). The amount of primary amines is determined from XPS data after 4-(trifluoromethyl) benzaldehyde (TFBA) chemical derivatization.
Subject Atomic, Molecular, Nuclear, Particle and Plasma Physics not elsewhere classified
Keyword(s) amination/amidation
functional POSS
functionalization of polymers
plasma treatment
selective grafting
DOI - identifier 10.1002/ppap.201600244
Copyright notice © 2017 Wiley-VCH Verlag
ISSN 1612-8850
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