Optically absorbing trilayer films fabricated using a filtered cathodic vacuum arc

Bilus Abaffy, N, Partridge, J, Du Plessis, J and McCulloch, D 2008, 'Optically absorbing trilayer films fabricated using a filtered cathodic vacuum arc', Physica Status Solidi (A) Applications and Materials Science, vol. 205, no. 6, pp. 1439-1442.


Document type: Journal Article
Collection: Journal Articles

Title Optically absorbing trilayer films fabricated using a filtered cathodic vacuum arc
Author(s) Bilus Abaffy, N
Partridge, J
Du Plessis, J
McCulloch, D
Year 2008
Journal name Physica Status Solidi (A) Applications and Materials Science
Volume number 205
Issue number 6
Start page 1439
End page 1442
Total pages 4
Publisher Wiley VGH Verlag GmbH and Co
Abstract A Filtered Cathodic Vacuum Arc (FCVA) deposition system has been used to produce Al2O3/Al/Al2O3 trilayers for use as optically absorbing coatings. Ellipsometry was used to measure the optical constants of the AlO, films and X-ray photo-electron spectroscopy (XPS) was used to measure their stoichiometry. It was found that a wide range of Ar/O2 inlet flow-rates could be used to produce stoichiometric Al2O3 in the FCVA system. Several Al2O 3/Al/Al2O3 tri-layere have been produced with different Al layer thicknesses and the simulated and experimental reflection characteristics have been compared. An average reflectance of 4% was achieved over the visible spectrum for the optimised trilayer coating deposited on silicon.
Subject Surfaces and Structural Properties of Condensed Matter
Keyword(s) cavity resonators
optical constants
photoelectron spectroscopy
reflection
silicon
stoichiometry
vacuum
vacuum applications
vacuum deposition
vacuum technology
DOI - identifier 10.1002/pssa.200778103
Copyright notice © 2008 WILEY-VCH Verlag GmbH & Co, KGaA.
ISSN 1862-6300
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