Application of dry film resist in the fabrication of microfluidic chips for droplet generation

Leech, P, Wu, N and Zhu, Y 2009, 'Application of dry film resist in the fabrication of microfluidic chips for droplet generation', Journal of Micromechanics and Microengineering, vol. 19, no. 6, 065019, pp. 1-6.


Document type: Journal Article
Collection: Journal Articles

Title Application of dry film resist in the fabrication of microfluidic chips for droplet generation
Author(s) Leech, P
Wu, N
Zhu, Y
Year 2009
Journal name Journal of Micromechanics and Microengineering
Volume number 19
Issue number 6
Article Number 065019
Start page 1
End page 6
Total pages 6
Publisher Institute of Physics Publishing Ltd.
Abstract The combined use of film transparency masks and dry laminar resist (Shipley 5038) has enabled the rapid fabrication of prototype devices for droplet generation. The resolution limit of structures in the resist was controlled by the type of mask (transparency or electron beam Cr mask), the density of the pattern in transparency masks (2400 or 5080 dpi) and the thickness of the resist in the range of 35-140 ?m. Flow-focusing devices with master patterns based on dry film resist were replicated as a Ni shim and hot embossed into Plexiglas 99524. These devices were used to generate oil/water droplets with a well-defined dependence of diameter and frequency on the flow parameters.
Subject Electrical and Electronic Engineering not elsewhere classified
DOI - identifier 10.1088/0960-1317/19/6/065019
Copyright notice © 2009 IOP Publishing Ltd.
ISSN 0960-1317
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