Alkali ratio control for lead-free piezoelectric thin films utilizing elemental diffusivities in RF plasma

Nili Ahmadabadi, H, Kandjani, A, Du Plessis, J, Bansal, V, Kalantar Zadeh, K, Sriram, S and Bhaskaran, M 2013, 'Alkali ratio control for lead-free piezoelectric thin films utilizing elemental diffusivities in RF plasma', CrystEngComm, vol. 15, pp. 7222-7229.


Document type: Journal Article
Collection: Journal Articles

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Title Alkali ratio control for lead-free piezoelectric thin films utilizing elemental diffusivities in RF plasma
Author(s) Nili Ahmadabadi, H
Kandjani, A
Du Plessis, J
Bansal, V
Kalantar Zadeh, K
Sriram, S
Bhaskaran, M
Year 2013
Journal name CrystEngComm
Volume number 15
Start page 7222
End page 7229
Total pages 8
Publisher RSC Publications
Abstract High performance piezoelectric thin films are generally lead-based, and find applications in sensing, actuation and transduction in the realms of biology, nanometrology, acoustics and energy harvesting. Potassium sodium niobate (KNN) is considered to be the most promising lead-free alternative, but it is hindered by the inability to control and attain perfect stoichiometry materials in the thin film form while using practical large area deposition techniques. In this work, we identify the contribution of the elemental diffusivities in the radio frequency (RF) plasma in determining the alkali loss in the KNN thin films. We have also examined the effect of the substrate temperature during the RF magnetron sputtering deposition on the crystal structure of the substrate and KNN thin films, as well as the effect of the postannealing treatments. These results indicate the need for well-designed source materials and the potential to use the deposition partial pressure to alter the dopant concentrations.
Subject Surfaces and Structural Properties of Condensed Matter
Nanomaterials
Functional Materials
Keyword(s) KNN
thin films
alkali loss
alkali ratio
XPS
XRD
RF plasma
elemental diffusivities
functional materials and microsystems
DOI - identifier 10.1039/C3CE40508G
Copyright notice © The Royal Society of Chemistry 2013
ISSN 1466-8033
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