Anodization of Ti thin film deposited on ITO

Sadek, A, Zheng, H, Latham, K, Wlodarski, W and Kalantar-Zadeh, K 2009, 'Anodization of Ti thin film deposited on ITO', Langmuir, vol. 25, no. 1, pp. 509-514.


Document type: Journal Article
Collection: Journal Articles

Title Anodization of Ti thin film deposited on ITO
Author(s) Sadek, A
Zheng, H
Latham, K
Wlodarski, W
Kalantar-Zadeh, K
Year 2009
Journal name Langmuir
Volume number 25
Issue number 1
Start page 509
End page 514
Total pages 5
Publisher Amer Chemical Soc
Abstract We have investigated several key aspects for the self-organization of nanotubes in RF sputtered titanium (Ti) thin films formed by the anodization process in fluoride-ion-containing neutral electrolytes. Ti films were deposited on indium tin oxide (ITO) glass substrates at room temperature and 300 °C, and then anodized. The films were studied using scanning electron microscopy (SEM), X-ray diffraction (XRD), and UV−vis spectrometry before and after anodization. It was observed that anodization of high temperature deposited films resulted in nanotube type structures with diameters in the range of 10−45 nm for an applied voltage of 5−20 V. In addition, the anatase form of TiO2 is formed during the anodization process which is also confirmed using photocurrent measurements. However, the anodization of room temperature deposited Ti films resulted in irregular pores or holes.
Subject Nanochemistry and Supramolecular Chemistry
DOI - identifier 10.1021/la802456r
Copyright notice © 2009 American Chemical Society.
ISSN 0743-7463
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